Cymer and ASML ship first EUV source that could extend Moore's law ten more years

Lithography systems manufacturer ASML (Veldhoven, The Netherlands) and lithography light-source manufacturer Cymer (San Diego, CA) announced the shipment of the world's first fully integrated laser-produced plasma (LPP) extreme ultraviolet (EUV) lithography source to ASML. The companies say that EUV will support Moore's Law--the trend toward more powerful, energy-efficient yet affordable chips--for at least another ten years.

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