Researchers at this year’s International Workshop on EUV Lithography in Honolulu, are discussing new approaches to many of the intransigent problems that plague this long-anticipated yet still-not-ready chip-printing method. These include new ways of generating the extreme ultraviolet (EUV) light, figuring out a better way to inspect nanometer-scale parts of the system, mitigating contamination generated by EUV light sources, and producing sharper nanometer-scale patterns on chips.
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