The light sources powering the next-generation chipmaking technique, extreme ultraviolet lithography (EUVL), are too dim, according to industry experts. And that’s one of the main reasons why semiconductor manufacturers worry that the technology will not be ready to produce advanced chips a few years from now. But Almantas Galvanauskas, a professor of electrical engineering at the University of Michigan at Ann Arbor, believes he has a way to boost their power by using a type of industrial laser called a fiber laser. He presented his research two weeks ago at the International Workshop on Extreme Ultraviolet Lithography, in Honolulu.
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